Communication

Growth of Ultrathin Organic Semiconductor Microstripes with Thickness Control in the Monolayer Precision

Dr. Liqiang Li

Physikalisches Institut and Center for Nanotechnology (CeNTech), Universität Münster, 48149 Münster (Germany)

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Dr. Peng Gao

Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz (Germany)

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Dr. Wenchong Wang

Physikalisches Institut and Center for Nanotechnology (CeNTech), Universität Münster, 48149 Münster (Germany)

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Prof. Klaus Müllen

Corresponding Author

E-mail address: [email protected]‐mainz.mpg.de

Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz (Germany)

Klaus Müllen, Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz (Germany)

Lifeng Chi, Physikalisches Institut and Center for Nanotechnology (CeNTech), Universität Münster, 48149 Münster (Germany)

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Prof. Harald Fuchs

Physikalisches Institut and Center for Nanotechnology (CeNTech), Universität Münster, 48149 Münster (Germany)

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Prof. Lifeng Chi

Corresponding Author

E-mail address: [email protected]‐muenster.de

Physikalisches Institut and Center for Nanotechnology (CeNTech), Universität Münster, 48149 Münster (Germany)

Institute of Functional Nano and Soft Materials (FUNSOM) and Collaborative Innovation Center of Suzhou Science and Technology, Soochow University, 199 Ren‐Ai Road, Suzhou Jiangsu 215123 (P.R. China)

Klaus Müllen, Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz (Germany)

Lifeng Chi, Physikalisches Institut and Center for Nanotechnology (CeNTech), Universität Münster, 48149 Münster (Germany)

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First published: 31 October 2013

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Citations: 58

This work was funded by the Germany–China Joint Project TRR61 (DFG‐NSFC Transregio Project), the NSFC key project (grant number 91227201) and EU project (grant number FP7‐People‐2009‐IRSES/247641).

Abstract

Organic semiconductors: Growth of ultrathin (<15 nm), continuous, and microstructured organic semiconductor (OSC) films at monolayer precision is important for organic electronics and a challenging task. Uniform monolayer to hexalayer (ca. 1.6–12 nm; see picture) dendritic OSC microstripes at monolayer precision are grown by a dip‐coating process.

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